Effect of chromium additions on the structure and physical properties of manganese-based films

Authors

  • V. F. Bashev Oles Honchar Dnipro National University, Dnipro, Ukraine
  • O. I. Kushnerov Oles Honchar Dnipro National University, Dnipro, Ukraine
  • N. A. Kutseva Oles Honchar Dnipro National University, Dnipro, Ukraine
  • S. I. Ryabtsev Oles Honchar Dnipro National University, Dnipro, Ukraine

DOI:

https://doi.org/10.15421/332126

Keywords:

thin film, ion-plasma sputtering, coercive force, metastable state, nanocrystalline phase

Abstract

The formation of metastable structures of manganese films with chromium additions obtained by the method of modernized three-electrode ion-plasma sputtering is studied. It is shown that the deposition of pure manganese leads to the formation of nanocrystalline β-Mn and MnO oxide. Heating in vacuum above 700 K leads to the film oxidation. The addition of Cr to the composition of the films prevents the formation of MnO oxide. It is shown that the activation energy of structural changes decreases with an increase in the energy of deposited atoms for pure manganese and MnCr films. Magnetization hysteresis is observed only in freshly sprayed Mn and MnCr films.

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Published

15-12-2021

Issue

Vol. 29 No. 2 (2021)

Section

Articles