Effect of thermomechanical treatments on crystallization behavior and magnetic properties of Co-Si-B microwires

Authors

  • L. Bartashevska Dnipro University of Technology, Dnipro, Ukraine
  • N. Kutseva Dnipro University of Technology, Dnipro, Ukraine https://orcid.org/0000-0002-6580-120X
  • A. Podliatska Dnipro University of Technology, Dnipro, Ukraine
  • M. Tkachenko Dnipro University of Technology, Dnipro, Ukraine

DOI:

https://doi.org/10.15421/332511

Keywords:

microwire, nanocrystalline structure, stresses, magnetic properties, X-ray diffraction

Abstract

The influence of heat treatments under tensile stresses on the thermal stability of the amorphous phase, crystallization processes and magnetic properties of glass-coated Co-Si-B microwires is investigated. It is found that conventional annealing leads to relaxation of internal stresses and the formation of primary α-Co crystals in the residual amorphous matrix. Annealing under tensile stress increases the thermal stability of amorphous phase by 50 – 60 оС and expands the temperature range for practical application of soft magnetic microwires.

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Published

26-12-2025

Issue

Vol. 33 No. 2 (2025)

Section

Articles