Effect of thermomechanical treatments on crystallization behavior and magnetic properties of Co-Si-B microwires

Анотація

The influence of heat treatments under tensile stresses on the thermal stability of the amorphous phase, crystallization processes and magnetic properties of glass-coated Co-Si-B microwires is investigated. It is found that conventional annealing leads to relaxation of internal stresses and the formation of primary α-Co crystals in the residual amorphous matrix. Annealing under tensile stress increases the thermal stability of amorphous phase by 50 – 60 ^оС and expands the temperature range for practical application of soft magnetic microwires.